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25.4mm Dia., 19nm (65eV), 5° EUV/XUV Attosecond Multilayer Flat Mirror

See More by UltraFast Innovations (UFI)
Stock #16-765 New
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Diameter (mm):
25.40 ±0.13
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)
Back Surface:
Commercial Polish
Surface Quality:
10-5 (substrate)
Coating Specification:
Rs > 38% @ 65eV/19nm
EUV Multilayer (19nm)
Angle of Incidence (°):
Clear Aperture (%):
Design Wavelength DWL (nm):
Fine Ground
Parallelism (arcmin):
Surface Roughness (Angstroms):
Flat Mirror
Surface Flatness (P-V):
Center Energy (eV):
65 ±2
Bandwidth (eV):
Supported Pulse Duration:
330 attoseconds
Edge Thickness ET (mm):
6.35 ±0.20

Regulatory Compliance


Product Family Description

  • Designed for 330 Attosecond Pulses @ 65eV (19nm)
  • Multilayer Coating with 38% Peak Reflectivity
  • ≤1Å Surface Roughness Superpolished Substrates
  • EUV Flat Mirrors and EUV Spherical Mirrors Designed at 13.5nm Also Available

UltraFast Innovations (UFI) Extreme Ultraviolet (EUV) Attosecond Multilayer Mirrors are designed for steering, focusing, and shaping attosecond pulses. Their multilayer coating is centered at 65eV (19nm) with a 6eV (1.8nm) bandwidth and provides a peak reflectivity of 38% for s-polarized light. These mirrors support EUV pulses with a temporal duration of 330 attoseconds. UFI Extreme Ultraviolet (EUV) Attosecond Mirrors are ideal for attosecond pulse generation and shaping based on high harmonic generation (HHG), free electron lasers (FELs), or other quantum optical applications. Flat and concave mirrors with a 25.4mm diameter are available; please contact us if your application requires an EUV multilayer mirror with a customized center energy, bandwidth, or other specifications.

Technical Information

Technical Information

Technical Information