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13.5nm, 25.4mm Dia, 5° AOI, EUV Spherical Mirror

TECHSPEC® Extreme Ultraviolet (EUV) Spherical Mirrors

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Stock #11-730 3-5 days
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S$5,727.50
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S$5,727.50
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Design Wavelength DWL (nm):
13.5
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)
Surface Roughness (Angstroms):
<3 RMS
Diameter (mm):
25.40 +0.00/-0.13
Effective Focal Length EFL (mm):
250.00
Radius of Curvature (mm):
500.00
Coating:
Mo/Si Multilayer
Top Layer: Silicon
Coating Specification:
Rabs >60% @ 13.5nm
Coating Type:
Metal/Semiconductor
Radius R1 (mm):
500.00
Thickness (mm):
6.35 ±0.25
Type:
Spherical Mirror
Full Width-Half Max FWHM (nm):
0.50

Regulatory Compliance

RoHS:
Compliant
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Certificate of Conformance:
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Product Family Description

  • Mo/Si Multilayer Coating on Super-Polished Substrates
  • Maximum Achievable Reflection at 13.5nm
  • Designed for EUV Beam Focusing Applications
  • Narrow Pass Band for HHG Applications

Extreme Ultraviolet (EUV) Spherical Mirrors feature a multilayer Mo/Si coating providing greater than 60% reflection at 13.5nm. They are designed for a 5° angle of incidence and intended for focusing unpolarized EUV laser sources. A surface roughness of less than 3Å RMS minimizes scatter. This is essential for EUV wavelengths which experience more scattering than longer wavelengths. EUV Spherical Mirrors have a very narrow pass band of approximately 0.5nm, ensuring that only the 13.5nm harmonic of interest is reflected in high harmonic generation (HHG) applications. Typical applications for EUV spherical mirrors include Coherent Diffractive Imaging (CDI), EUV imaging, and EUV nanomachining.

Note: Test data from each mirror's production run sample included.