Coherent® LightSmyth™ 855nm, 200nm Groove Depth, 25mm Sq. Linear Silicon Nanostamp

Product Family Description

• Nanoscale-Textured Grooved Surfaces
• Variable Groove Period and Groove Depth
• Ideal for Nanophotonics Research Applications

Coherent® LightSmyth™ Nanopattern Silicon Stamps consist of nanoscale-textured surfaces patterned on single-crystal silicon substrates. Through reactive ion etching, linear grooves with a trapezoidal cross-section are etched into the substrate surface, resembling conventional gratings. The etching process enables different period and depth specifications for these grooves, as well as more complex patterns such as lattices. Coherent® LightSmyth™ Nanopattern Silicon Stamps are ideal for nanophotonics research applications in the fields of optics and photonics, biology, chemistry, nanoimprinting, and microfluidics.

Note: II-VI Incorporated is now Coherent Corp.