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1000 - 1060nm, 25.4mm Dia. x 6.35mm Thickness, Ultrafast Laser Line Mirror

Low GDD Ultrafast Mirrors

Low GDD Ultrafast Mirrors
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Low GDD Ultrafast Mirrors
Stock #17-285 New
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S$230.95
Qty 1-5
S$230.95
Qty 6+
S$215.45
Volume Pricing
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Surface Quality:
20-10
Type:
Laser Mirror
Typical Applications:
Yb:doped 1st Harmonic
Parallelism (arcmin):
<3
Clear Aperture (%):
>90
Durability:
MIL-C-675A
Back Surface:
Commercial Polish
Coating Specification:
Ravg >99.5% @ 1000 - 1060nm
GDD Specification:
0 ±30 fs2 @ 1000-1060nm (p-pol)
0 ±30 fs2 @ 970-1110nm (s-pol)
Wavelength Range (nm):
1000 - 1060
Surface Flatness:
λ/6
Coating Type:
Dielectric
Coating:
Ultrafast (1000-1060nm)
Design Wavelength DWL (nm):
1030
Diameter (mm):
25.40 +0/-0.1
Thickness (mm):
6.35 ±0.20
Angle of Incidence (°):
45
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More

Regulatory Compliance

RoHS:

Product Family Description

Low Group Delay Dispersion (GDD) Ultrafast Mirrors are designed for applications utilizing Er:glass, Ti:sapphire, or Ytterbium-doped lasers. These laser mirrors are optimized for maximum reflection over broad wavelength ranges with designs available for wavelengths between 360 and 3300nm. The multilayer dielectric coating is designed for minimal GDD, making them ideal for ultrafast beam transport applications. Low GDD Ultrafast Mirrors feature low thermal coefficient substrates for applications with various ultrafast laser sources such as Ti:sapphire, Yb:doped, fiber, as well as OPA/OPO, and OPCPA systems.

Note: Please contact us for custom wavelengths, angles, and sizes.

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